JPH0219988B2 - - Google Patents

Info

Publication number

JPH0219988B2

JPH0219988B2 JP7341782A JP7341782A JPH0219988B2 JP H0219988 B2 JPH0219988 B2 JP H0219988B2 JP 7341782 A JP7341782 A JP 7341782A JP 7341782 A JP7341782 A JP 7341782A JP H0219988 B2 JPH0219988 B2 JP H0219988B2

Authority

JP

Japan

Prior art keywords

coating layer

silicon carbide

silicon

carbide substrate

substrate

Prior art date

1982-05-04

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

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• 239000000758 substrate Substances 0.000 claims description 132
• HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 101
• 229910010271 silicon carbide Inorganic materials 0.000 claims description 101
• 239000011247 coating layer Substances 0.000 claims description 89
• 239000010410 layer Substances 0.000 claims description 45
• 238000003466 welding Methods 0.000 claims description 38
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 30
• 239000012212 insulator Substances 0.000 claims description 27
• 238000000034 method Methods 0.000 claims description 24
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 22
• 229910052782 aluminium Inorganic materials 0.000 claims description 18
• XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 18
• 229910052710 silicon Inorganic materials 0.000 claims description 18
• 239000010703 silicon Substances 0.000 claims description 18
• 239000011248 coating agent Substances 0.000 claims description 17
• 229910052573 porcelain Inorganic materials 0.000 claims description 17
• 238000004519 manufacturing process Methods 0.000 claims description 15
• 239000000203 mixture Substances 0.000 claims description 15
• 239000000463 material Substances 0.000 claims description 14
• 230000001590 oxidative effect Effects 0.000 claims description 13
• 239000000377 silicon dioxide Substances 0.000 claims description 13
• 235000012239 silicon dioxide Nutrition 0.000 claims description 13
• FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 12
• 229910052749 magnesium Inorganic materials 0.000 claims description 12
• 239000011777 magnesium Substances 0.000 claims description 12
• ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 11
• 229910052796 boron Inorganic materials 0.000 claims description 11
• 238000010438 heat treatment Methods 0.000 claims description 11
• 239000011347 resin Substances 0.000 claims description 11
• 229920005989 resin Polymers 0.000 claims description 11
• 239000000126 substance Substances 0.000 claims description 11
• OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 10
• DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 10
• WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 10
• OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 10
• ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 10
• HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
• 229910052787 antimony Inorganic materials 0.000 claims description 10
• WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 10
• 229910052785 arsenic Inorganic materials 0.000 claims description 10
• RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 10
• 229910052797 bismuth Inorganic materials 0.000 claims description 10
• JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 10
• 229910052793 cadmium Inorganic materials 0.000 claims description 10
• BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 10
• 229910052791 calcium Inorganic materials 0.000 claims description 10
• 239000011575 calcium Substances 0.000 claims description 10
• 229910052732 germanium Inorganic materials 0.000 claims description 10
• GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 10
• 229910052744 lithium Inorganic materials 0.000 claims description 10
• 229910052698 phosphorus Inorganic materials 0.000 claims description 10
• 239000011574 phosphorus Substances 0.000 claims description 10
• 229910052700 potassium Inorganic materials 0.000 claims description 10
• 239000011591 potassium Substances 0.000 claims description 10
• 229910052708 sodium Inorganic materials 0.000 claims description 10
• 239000011734 sodium Substances 0.000 claims description 10
• 229910052720 vanadium Inorganic materials 0.000 claims description 10
• GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims description 10
• 229910052725 zinc Inorganic materials 0.000 claims description 10
• 239000011701 zinc Substances 0.000 claims description 10
• 229910052788 barium Inorganic materials 0.000 claims description 9
• DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 9
• 239000011133 lead Substances 0.000 claims description 9
• 229910052712 strontium Inorganic materials 0.000 claims description 9
• CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 9
• 150000001875 compounds Chemical class 0.000 claims description 5
• 239000011521 glass Substances 0.000 claims description 5
• JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 3
• 239000004962 Polyamide-imide Substances 0.000 claims description 3
• 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
• 239000002253 acid Substances 0.000 claims description 3
• 229920002312 polyamide-imide Polymers 0.000 claims description 3
• 229920001721 polyimide Polymers 0.000 claims description 3
• 239000009719 polyimide resin Substances 0.000 claims description 3
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
• 229910052582 BN Inorganic materials 0.000 claims 2
• PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 2
• QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
• 239000008199 coating composition Substances 0.000 claims 2
• PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 2
• -1 sialon Chemical compound 0.000 claims 2
• 229910052726 zirconium Inorganic materials 0.000 claims 2
• PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 16
• 230000003647 oxidation Effects 0.000 description 16
• 238000007254 oxidation reaction Methods 0.000 description 16
• 238000010292 electrical insulation Methods 0.000 description 13
• 238000009413 insulation Methods 0.000 description 13
• 229910004298 SiO 2 Inorganic materials 0.000 description 8
• TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 8
• 229910018072 Al 2 O 3 Inorganic materials 0.000 description 6
• LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 6
• 230000008018 melting Effects 0.000 description 6
• 238000002844 melting Methods 0.000 description 6
• 230000005496 eutectics Effects 0.000 description 5
• 230000007704 transition Effects 0.000 description 5
• 230000015572 biosynthetic process Effects 0.000 description 4
• 239000011148 porous material Substances 0.000 description 4
• 238000007650 screen-printing Methods 0.000 description 4
• 229910052783 alkali metal Inorganic materials 0.000 description 3
• 150000001340 alkali metals Chemical class 0.000 description 3
• 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
• 150000001342 alkaline earth metals Chemical class 0.000 description 3
• 239000007864 aqueous solution Substances 0.000 description 3
• 239000004020 conductor Substances 0.000 description 3
• 229910052906 cristobalite Inorganic materials 0.000 description 3
• 230000007423 decrease Effects 0.000 description 3
• 230000007547 defect Effects 0.000 description 3
• 210000003298 dental enamel Anatomy 0.000 description 3
• 230000000994 depressogenic effect Effects 0.000 description 3
• 230000000694 effects Effects 0.000 description 3
• 230000017525 heat dissipation Effects 0.000 description 3
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
• XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
• UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
• OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
• MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
• 229910045601 alloy Inorganic materials 0.000 description 2
• 239000000956 alloy Substances 0.000 description 2
• 239000001110 calcium chloride Substances 0.000 description 2
• 229910001628 calcium chloride Inorganic materials 0.000 description 2
• 229910052799 carbon Inorganic materials 0.000 description 2
• 238000000576 coating method Methods 0.000 description 2
• 229910052878 cordierite Inorganic materials 0.000 description 2
• JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 2
• KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
• 229910001882 dioxygen Inorganic materials 0.000 description 2
• 238000001035 drying Methods 0.000 description 2
• 238000010304 firing Methods 0.000 description 2
• 229910052839 forsterite Inorganic materials 0.000 description 2
• 239000007789 gas Substances 0.000 description 2
• HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 2
• 229910052751 metal Inorganic materials 0.000 description 2
• 239000002184 metal Substances 0.000 description 2
• 229910052863 mullite Inorganic materials 0.000 description 2
• 230000035939 shock Effects 0.000 description 2
• 229910052596 spinel Inorganic materials 0.000 description 2
• 239000011029 spinel Substances 0.000 description 2
• 229910052845 zircon Inorganic materials 0.000 description 2
• GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
• CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
• 238000009825 accumulation Methods 0.000 description 1
• HDYRYUINDGQKMC-UHFFFAOYSA-M acetyloxyaluminum;dihydrate Chemical compound O.O.CC(=O)O[Al] HDYRYUINDGQKMC-UHFFFAOYSA-M 0.000 description 1
• 239000000654 additive Substances 0.000 description 1
• 150000004645 aluminates Chemical class 0.000 description 1
• ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
• 229910000323 aluminium silicate Inorganic materials 0.000 description 1
• 229940009827 aluminum acetate Drugs 0.000 description 1
• 229910052786 argon Inorganic materials 0.000 description 1
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
• 229910052790 beryllium Inorganic materials 0.000 description 1
• ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
• 239000005388 borosilicate glass Substances 0.000 description 1
• 230000001680 brushing effect Effects 0.000 description 1
• 238000001354 calcination Methods 0.000 description 1
• 229910052681 coesite Inorganic materials 0.000 description 1
• 229910052593 corundum Inorganic materials 0.000 description 1
• 239000013078 crystal Substances 0.000 description 1
• 230000006378 damage Effects 0.000 description 1
• HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
• 238000007598 dipping method Methods 0.000 description 1
• 238000005516 engineering process Methods 0.000 description 1
• 230000004927 fusion Effects 0.000 description 1
• 239000012535 impurity Substances 0.000 description 1
• 230000010354 integration Effects 0.000 description 1
• 230000001788 irregular Effects 0.000 description 1
• 229910000833 kovar Inorganic materials 0.000 description 1
• 239000005355 lead glass Substances 0.000 description 1
• 239000001301 oxygen Substances 0.000 description 1
• 229910052760 oxygen Inorganic materials 0.000 description 1
• 238000007747 plating Methods 0.000 description 1
• 238000007639 printing Methods 0.000 description 1
• 230000001737 promoting effect Effects 0.000 description 1
• 239000004065 semiconductor Substances 0.000 description 1
• 150000004760 silicates Chemical class 0.000 description 1
• RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
• 229910052814 silicon oxide Inorganic materials 0.000 description 1
• 238000005245 sintering Methods 0.000 description 1
• 238000005476 soldering Methods 0.000 description 1
• 238000005507 spraying Methods 0.000 description 1
• 229910052682 stishovite Inorganic materials 0.000 description 1
• 230000001988 toxicity Effects 0.000 description 1
• 231100000419 toxicity Toxicity 0.000 description 1
• 229910052905 tridymite Inorganic materials 0.000 description 1
• 238000009966 trimming Methods 0.000 description 1
• 229910001845 yogo sapphire Inorganic materials 0.000 description 1